| NAME | FEATURES | VENDOR |
|---|---|---|
| Iso Lok 200 | ICP Reactive Ion Etch system; Load locked ICP system capable of Reactive Ion Etching or PECVD. | Axic Inc. |
| Photomask Materials, Photoplates | High resolution photoglass for making masks; chrome, iron-oxide, emulsion photomasks are available. | Microchrome Technology Products |
| Photomasks | Custom Photomasks | HTA Photomask |
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